METAL AND DIELECTRIC MASKS:

Creative MicroSystems can design and fabricate a wide variety of ablation masks tailored to our customer's requirements. We work closely with our customers to determine the best solution for their application requirements and fabricate and test masks in our Class 10/100 clean room with high energy Deep UV and infrared lasers.

Creative MicroSystems makes masks with:

-  Substrates up to 200mm diameter or 12" square.
-  Fused silica, sapphire, CaF2, ZnSe/S, Si, Ge, many plastics
-  High uniformity
-  High efficiency
-  High damage threshold: >1-3 J/cm2 for dielectric masks or >250 mJ/cm2 for metal masks
-  Minimum feature size: < 5 micron -
-  Can be produced for laser wavelengths from 157nm to 1.06 micron
-  Coating, dicing and packaging options

HOLOGRAPHIC ABLATION MASKS:

Creative MicroSystems also develops and produces masks for use with lensless lithography systems - the mask both focuses and patterns the light. The high optical efficiency mask produces a wavefront that is remapped into the desired pattern and not reflected away as with an amplitude mask.

Capabilities of Creative Micro holographic masks include:

·  Very high damage threshold: up to 20 J/cm2
-  Fused silica, sapphire, CaF2, ZnSe, Si, Ge, many plastics
-  Minimum feature size: <1 micron
-  Can be produced for laser wavelengths from 193nm to 1064nm