Creative MicroSystems

Metrology

If you can't measure it, you can't make it: Sub-nm metrology capability is critical for process engineering and fabrication in the nano/micro realm. CMC's equipment includes

Quesant AFM for non-contact measurement to 1/10 angstrom
Tencor Long Scan Profiler for contact measurement to ten angstroms
qISI Dual Stage, Jeol and Amray SEM's
qLeitz Environmental-SEM (wet stage)
qShimadzu Scanning Spectrophotometer
qNicolet Avatar FTIR
qWyko 2500 interferometric microscope
qZygo Maxim GP laser interference Microscope
qZeiss Axiomat 2500x Optical Microscope

CMC also offers its metrology capabilities as an outside service.