Photomasks

Creative Microsystems produces emulsion, chrome, iron oxide, aluminum and dielectric photomasks using a direct write laser tool. When finer mask features are required a 5X reduction stepper or electron beam lithography tool is available. These photomasks can be used for a range of photolithographic techniques including proximity or contact printing, projection printing and ablation patterning. Production time can be as little as 1 day.

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