If you can’t measure it, you can’t make it: Sub-nm metrology capability is critical for process engineering and fabrication in the nano/micro realm.

CMC’s equipment includes:

  • Quesant AFM for non-contact measurement to 1/10 angstrom
  • Tencor Long Scan Profiler for contact measurement to ten angstroms
  • ISI Dual Stage, Jeol and Amray SEM’s
  • Leitz Environmental-SEM (wet stage)
  • Shimadzu Scanning Spectrophotometer
  • Nicolet Avatar FTIR
  • Wyko 2500 interferometric microscope
  • Zygo Maxim GP laser interference Microscope
  • Zeiss Axiomat 2500x Optical Microscope CMC also offers its metrology capabilities as an outside service.

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