MASKS

Photolithography Process:The production of micron scale and smaller patterns is accomplished using high precision and durable photomasks and a photosensitive layer on a substrate. This is the core technology behind all microelectronic circuits and other highly detailed structures. Creative Microsystems has invested heavily in the infrastructure required for generating micropatterns.

Products:

Photomasks Creative Microsystems produces emulsion, chrome, iron oxide, aluminum and dielectric photomasks using a direct write laser tool. When finer mask features are required a 5X reduction stepper or electron beam lithography tool is available. These photomasks can be used for a range of photolithographic techniques including proximity or contact printing, projection printing and ablation patterning. Production time can be as little as 1 day.

Laser Direct Write Masks: If only a few parts are needed or if the substrate does not lend itself to traditional photolithography using a photomask, Creative Microsystems is equipped to use direct laser patterning of the substrate. 3D structures can be produced using a “gray-scale” direct print mode.

Ablation Masks: A sufficiently powerful laser can vaporize or “ablate” a pattern into the substrate material. Creative Microsystems is a pioneer in the development and use of photomasks that can handle the extremely high powers needed for ablation lithography. Photomasks are fabricated in our Class 10/100 cleanroom and are tested in-house with high energy UV and IR lasers.

Holographic Projection Lithography Masks: Creative Microsystems has developed a lensless projection technique using a patented in-line holographic mask. This approach offers several distinct advantages such as high power handling, resistance to damage or debris, simplified optical system and true 3D.

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