In comparison to an amplitude mask and projection lens system, the high power holographic projection mask approach has significant advantages. By combining the functions of beam homogenizer, mask and projection lens into a single in-line optical element, this approach yields a highly efficient but greatly simplified lithography system for ablation patterning. A lower cost ablation process tool with greater throughput is one result. A holographic projection mask also exhibits image redundancy, reducing the need for beam homogenization and increasing its resistance to print defects produced by contamination or damage.
As the microelectronics industrys challenges for higher throughput become more evident, a laser ablation system that has nearly unlimited power handling, an order of magnitude greater light efficiency, more versatile imaging modes, a significantly lower price tag and a reduced cost of ownership model.
The work by Bill Parker at Creative MicroSystems involves a phase only transmission in-line optical hologram to shape beams and image patterns on a work piece. Bill's paper presented at the SPIE conference in San Diego on August, examines the use of high power holographic projection masks to replace traditional reflective photomasks and the associated projection imaging optics currently used in laser ablation systems.
Contact Creative MicroSystems at Sales@CreativeMicro for a copy of the paper presented at SPIE West.